Possession and Revolt by Caitlyn Wilson

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Soft Data and Common Wares — Call for Artist Residency 2023-2024

Submitted on August 16, 2023 - 11:14am
Soft Data Zine Cover
Soft Data & Common Wares #1 Zine Cover. Courtesy of Audrey Desjardins

WHAT IS SOFT DATA AND COMMON WARES?

‘Soft Data and Common Wares’ is an ongoing interdisciplinary collaboration between the DXARTS Softlab (e-textiles and wearable technology lab run by Afroditi Psarra in DXARTS) and Studio Tilt (interaction design research studio run by Audrey Desjardins in Design). The collaboration probes the connections between working with data-driven approaches and crafting physical artifacts, and examines the intimate spaces of the home and the body, and the assistive and affective technologies they engage with. Both labs are interested in the process of collecting, archiving, and critically transcoding data from the intimate spaces of the home and the body, and the search for meaningful interpretations; they use material experimentations and prototyping as techniques to shape social identities and create intellectual and cultural commons.

CALL FOR ARTIST RESIDENCY

We invite artists to join us in our conversations on diverse topics such as: the non-neutrality of data, algorithmic bias, digital labor, the invisible infrastructures of data collection, gender and the body, networks, methods, sonic technologies, interpretative nature of data, and earth + space + body. The goal is to create connections (between people, projects, and spaces) and build a vocabulary of commons.

The two (2) 4-week residencies happening in Spring 2024 will be hosted at the University of Washington, Seattle. Payment and support includes honorarium, travel funding and accommodations.

Application Deadline: October 1st, 2023

Application is open to both local and international artists, designers, performers, creative researchers with project proposals that explore the creation of artifacts, materials and processes of any medium (multidisciplinary practices encouraged).

VIEW FULL INFORMATION + APPLICATION

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